Smaller integrated circuit dimensions, new materials and larger wafers all contribute to the challenges faced by semiconductor manufacturers in the design, production and testing of today's leading-edge chips. To address those challenges, Cascade Microtech (NASDAQ: CSCD), a leader in advanced electrical metrology systems and production probe cards, today announced the eVue™ digital imaging system to enable dramatic productivity gains in semiconductor wafer navigation and testing. Designed primarily for engineers doing process development or device characterization and modeling, using the eVue digital imaging system can easily save two to three hours a day that is currently wasted on inefficient semiconductor navigation and test data collection issues.
Optimized for on-wafer test with Cascade Microtech's wafer probing stations, eVue allows users to navigate, observe, and measure leading-edge devices much quicker and more effectively than with a conventional microscope. It combines new wafer probe navigation tools and advanced video processing with next-generation digital microscope technology developed by Umech Technologies, a partner of Cascade Microtech.
"The eVue digital imaging system radically improves upon today's methods of wafer navigation, test set-up, and probe contact accuracy for engineering measurements," said John Pence, vice president and general manager, Engineering Products Division, Cascade Microtech. "With its one-of-a-kind integration of microscopy, digital imaging, and software, eVue is the first system to allow semiconductor R&D engineers to quickly set up, navigate, and profile wafers in one complete system."